| 摘要 |
PURPOSE: To obtain a positive type resist excellent in sensitivity, resolution, pattern shape, etc., and fit for fine working by incorporating alkali-soluble phenolic resin, a quinonediazidesulfonic ester type photosensitive agent and a phenol compd. having specified structural units. CONSTITUTION: This resist compsn. contains alkali-soluble phenolic resin, a quinonediazidesulfonic ester type photosensitive agent and a phenol compd. having structural units represented by the formula, wherein each of R1-R3 is H, hydroxyl, halogen, substitutable alkyl, substitutable cycloalkyl, substitutable alkenyl, substitutable alkoxy or substitutable aryl and each of R4-R11 is H, substitutable alkyl, substitutable cycloalkyl, substitutable alkenyl or substitutable aryl. The wt. average mol.wt. (expressed in terms of polystyrene) of the phenol compd. in a pattern by GPC using a detector with UV of 254nm is <=2,000. |
