发明名称 |
Polymer having inert blocking groups |
摘要 |
An alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The polymer is used for the formulation of acid hardening photoresists and the presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
|
申请公布号 |
US5541263(A) |
申请公布日期 |
1996.07.30 |
申请号 |
US19950404933 |
申请日期 |
1995.03.16 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
THACKERAY, JAMES W.;ORSULA, GEORGE W.;DENISON, MARK D.;SINTA, ROGER;ABLAZA, SHERI L. |
分类号 |
G03F7/004;G03F7/023;(IPC1-7):C08F8/34;G03F7/038 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|