发明名称 PROCESS SIMULATION DEVICE
摘要 PURPOSE: To provide a process simulation device which can analyze the impurity concentration distribution of a microfabricated semiconductor element in short analysis time. CONSTITUTION: A simple process simulator 4 which can repetitively execute simulation while input (process) data 3 is corrected and a highly precise process simulator 101 for obtaining a highly precise result 5 based on a process decided by the simulator 4 and for obtaining element characteristic (prediction) data 106 by a device simulator 105 are combined. A controller 2 controls them by adjusting them to the need of a user and two/three-dimensional process simulation is executed. Process simulation is repetitively executed for many times while the input process is corrected, and the appropriate process can be decided.
申请公布号 JPH08194730(A) 申请公布日期 1996.07.30
申请号 JP19950004638 申请日期 1995.01.17
申请人 HITACHI LTD 发明人 SUGAYA MASAHIRO;KANBARA SHIRO;NIIMI TOSHIO;YOKOMIZO KOICHI;KAWAKAMI MEGUMI
分类号 H01L21/22;G06F17/00;G06F17/50;G06F19/00;G06Q50/00;G06Q50/04;H01L21/00 主分类号 H01L21/22
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