发明名称 |
PROCESS SIMULATION DEVICE |
摘要 |
PURPOSE: To provide a process simulation device which can analyze the impurity concentration distribution of a microfabricated semiconductor element in short analysis time. CONSTITUTION: A simple process simulator 4 which can repetitively execute simulation while input (process) data 3 is corrected and a highly precise process simulator 101 for obtaining a highly precise result 5 based on a process decided by the simulator 4 and for obtaining element characteristic (prediction) data 106 by a device simulator 105 are combined. A controller 2 controls them by adjusting them to the need of a user and two/three-dimensional process simulation is executed. Process simulation is repetitively executed for many times while the input process is corrected, and the appropriate process can be decided. |
申请公布号 |
JPH08194730(A) |
申请公布日期 |
1996.07.30 |
申请号 |
JP19950004638 |
申请日期 |
1995.01.17 |
申请人 |
HITACHI LTD |
发明人 |
SUGAYA MASAHIRO;KANBARA SHIRO;NIIMI TOSHIO;YOKOMIZO KOICHI;KAWAKAMI MEGUMI |
分类号 |
H01L21/22;G06F17/00;G06F17/50;G06F19/00;G06Q50/00;G06Q50/04;H01L21/00 |
主分类号 |
H01L21/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|