| 摘要 |
A positive resist composition having excellent sensitivity, percentage residual film, resolution, heat resistance, storage stability, exposure margin, focus margin and other properties and comprising (A) an alkali-soluble phenolic resin, (B) a quinonediazidosulfonic ester photosensitizer, and (C) a phenolic compound, characterized in that the phenolic compound as the component (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having structural units represented by formula (I) and phenolic compounds (CD) represented by formula (II). In formula (I), R<1> and R<3> each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, R<4> to R<11> represent each independently hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted aryl, or optionally substituted alkoxy group, and n is a positive integer. In formula (II), R<12> to R<15> each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, provided at least one of R<12> to R<15> represents hydroxy and m is a positive integer.
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