发明名称 Semiconductor device with Schattky electrode
摘要 <p>A semiconductor device such as a GaAs MESFET or a Schottky barrier diode has a Schottky electrode having a breakdown voltage of improved uniformity and reliability. The Schottky barrier diode has forward and reverse current-voltage characteristics of improved uniformity and reliability. In the GaAs MESFET, an n&lt;+&gt; active layer is formed on a substrate of a compound semiconductor. A source electrode and a drain electrode are formed on the n&lt;+&gt; active layer. A high-resistivity layer is formed between the source and drain electrodes within the n&lt;+&gt; active layer by plasma processing. The high-resistivity layer has a surface state of 0.6-0.8 eV. A Schottky electrode forming a Schottky junction with the active layer is formed on the high-resistivity layer.</p>
申请公布号 EP0723300(A2) 申请公布日期 1996.07.24
申请号 EP19960100709 申请日期 1996.01.18
申请人 MURATA MANUFACTURING CO., LTD. 发明人 MARUKAWA, TAKASHI
分类号 H01L21/285;H01L21/329;H01L21/338;H01L29/47;H01L29/812;H01L29/872;(IPC1-7):H01L29/812;H01L29/10 主分类号 H01L21/285
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