发明名称 |
Semiconductor device with Schattky electrode |
摘要 |
<p>A semiconductor device such as a GaAs MESFET or a Schottky barrier diode has a Schottky electrode having a breakdown voltage of improved uniformity and reliability. The Schottky barrier diode has forward and reverse current-voltage characteristics of improved uniformity and reliability. In the GaAs MESFET, an n<+> active layer is formed on a substrate of a compound semiconductor. A source electrode and a drain electrode are formed on the n<+> active layer. A high-resistivity layer is formed between the source and drain electrodes within the n<+> active layer by plasma processing. The high-resistivity layer has a surface state of 0.6-0.8 eV. A Schottky electrode forming a Schottky junction with the active layer is formed on the high-resistivity layer.</p> |
申请公布号 |
EP0723300(A2) |
申请公布日期 |
1996.07.24 |
申请号 |
EP19960100709 |
申请日期 |
1996.01.18 |
申请人 |
MURATA MANUFACTURING CO., LTD. |
发明人 |
MARUKAWA, TAKASHI |
分类号 |
H01L21/285;H01L21/329;H01L21/338;H01L29/47;H01L29/812;H01L29/872;(IPC1-7):H01L29/812;H01L29/10 |
主分类号 |
H01L21/285 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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