发明名称 COMPLEX SURFACE ANALYSIS DEVICE
摘要 The multi-function surface analysis device performs the uniform surface etching regardless of the surface condition of the specimen in analyzing the depth profile of the specimen by using the specimen position adjuster(20) and the specimen holder(30). The device includes a tapered hole(22) for adjusting the specimen(33) position to keep normal to the ion gun, a rotary disk(23) of a doughnut shape having a rectangular protrusion(23a), a specimen position adjuster(20) having the protrusion(21) of a hemispheric shape, a shaft(31) inserted into the hole(22), ane under plate(32) having the groove(32a) receiving the rectangular protrusion(23a) to be flush with the upper plate(23) when the protrusion(21) and the concave surface(32b) are fitted to each other, and the upper plate(23).
申请公布号 KR960009752(B1) 申请公布日期 1996.07.24
申请号 KR19920011454 申请日期 1992.06.29
申请人 KOREA ELECTRONICS & TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 PARK, HYUNG - HO;KWAK, BYUNG - HWA;LEE, JOONG - HWAN;KWON, OH - JOON
分类号 G01B15/00;(IPC1-7):G01B15/00 主分类号 G01B15/00
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