发明名称 AN APPARATUS FOR HEATING CHAMBER GAS
摘要 A chamber gas heating device is provided to prevent generation of particles by not contacting a heater with a gas directly and maximize a contact surface between gas passage and a spiral groove. A heating part(10) has a body(11) made of a cylindrical heat conductor having an axial hole formed in a canter and a spiral groove formed around an outer periphery thereof, a heater(16) inserted in the axial hole and a gas passage(13) embedded in the spiral groove. A heat isolating part(30) made of fiber material encloses the outer periphery of the heating part, and a housing(40) made of metal material encloses the heat isolating part. The spiral groove has a depth larger than a height of the gas passage.
申请公布号 KR100784773(B1) 申请公布日期 2007.12.14
申请号 KR20070039119 申请日期 2007.04.23
申请人 FINETECH. CO., LTD. 发明人 KIM, YEONG DEOK
分类号 H01L21/00;H01L21/02 主分类号 H01L21/00
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