Deposition chamber and apparatus thereof

摘要

A chamber for depositing a film layer on a substrate (16) includes a support member (20) on which the substrate (16) is positioned for processing in the chamber, and a clamp ring (38) suspended in the chamber on a chamber shield (40). The support member (20) is positionable in the chamber to receive a substrate (16) thereon, and further positionable to pass the substrate (16) through the shield (40) and thereby lift the clamp ring (38) off the shield (40). After deposition is complete, the support member (20) retracts through the shield (40), to reposition the clamp (38) on the shield (40). In the event that a deposition material layer has formed between the substrate (16) and the clamp ring (38), the clamp ring (38) includes a plurality of actuators (70) thereon which force the substrate (16) out of the clamp ring (38) as the clamp ring (38) is repositioned on the shield (40). <IMAGE>