| 摘要 |
PURPOSE: To easily manufacture the optical waveguide which has high optical transmission efficiency through a small number of processes by irradiating an optical waveguide material with X rays. CONSTITUTION: After a silicon substrate 1 having silica glass 2 on its surface is mounted on a sample base, a vacuum chamber is reduced in internal pressure by a vacuum pump, etc. Then the substrate is irradiated with O-order light of synchrotron emitted light having specific peak wavelength through a Be window by using, for example, a synchrotron light emission device. Through this operation, the part (light guide part) 4 in the silica glass 2 which is irradiated with the synchrotron emitted light becomes approximately 1×10<-2> larger in refractive index than the part which is not irradiated with the synchrotron emitted light. After the silicon substrate 1 is taken out, the surface of the silica glass 2 and the surface of the part 4 which is irradiated with the synchrotron emitted light are coated with silica glass 5 which has a lower refractive index than, for example, the unirradiated part 4, thereby forming a three-dimensional waveguide 12. |
