发明名称 CHEMICAL VAPOR DEPOSITION OF MULLITE COATINGS AND POWDERS
摘要 <p>This invention is directed to the creation of mullite coatings and powders having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a coating or the powder from the reactant flow. The process will yield coatings which are dense and of uniform thickness.</p>
申请公布号 WO1996020903(A1) 申请公布日期 1996.07.11
申请号 US1996000482 申请日期 1996.01.05
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