| 摘要 |
<p>An exposure apparatus uses a projection optical system comprising a first lens Group G1 with a positive refracting power, a second lens group G2 with a negative refracting power, a third lens group G3 with a positive refracting power, a fourth lens group G4 with a negative refracting power, a fifth lens group G5 with a positive refracting power, and a sixth lens group G6 with a positive refracting power in order from the side of the first object R, wherein the second lens group G2 comprises a front lens L2F with a negative refracting power, a rear lens L2R of a negative meniscus shape, and an intermediate lens group G2M disposed between the front lens and the rear lens, and wherein the intermediate lens group G2M has a first lens LM1 with a positive refracting power, a second lens LM2 with a negative refracting power, and a third lens LM3 with a negative refracting power in order from the side of the first object R. The system is arranged to satisfy within suitable ranges of focal lengths for the first to sixth lens groups G1-G6, based on the above arrangement. <IMAGE></p> |
