Integrated field effect transistor and resonant tunneling diode

摘要

This is an integrated device which comprises an integrated transistor and resonant tunneling diode where the transistor comprises a substrate 10, a buffer layer 12 over the substrate 10, and a channel layer 14 over the buffer layer 12; and the resonant tunneling diode (RTD) comprises a first contact layer 18, a first tunnel barrier layer 20 over the first contact layer 18, a quantum well 22 over the first tunnel barrier layer 20, a second tunnel barrier layer 24 over the quantum well 22, and a second contact layer 26 over the second tunnel barrier layer 24. Other devices and methods are also disclosed.