发明名称 Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate
摘要 <p>A photosensitive resin composition comprising a high polymer binder, a monomer, a photopolymerization initiator generating a radical on exposure to visible light of a wavelength of 400 to 700 nm such as triazine compounds, titanocene compounds, or acridine compounds, an optically-activated acid generating agent generating an acid on exposure to light of a wavelength of 200 to 380 nm, and a color former developing a color in the presence of an acid, and a method manufacturing a printing master plate comprising the steps of exposing a photosensitive printing plate which has a laminated layer made from a photosensitive resin composition thereon to visible light of wavelength in the range of 400 to 600 nm selectively in an imagewise configuration in order to harden the resin composition layer, developing the photosensitive printing plate, and further exposing the developed plate to light of a wavelength in the range 200 to 380 nm. The photosensitive resin composition has a wide range of wavelengths of light to which the resin composition is sensitive on exposure and forms a good image with visible laser and the photosensitive printing plate is excellent in pattern distinctiveness, easy in handling, and excellent in working efficiency. The method is useful in an industrial field due to simplicity and easiness in view of the fact that it includes only the main steps of exposing the photosensitive printing plate to visible light of a wavelength of 400 to 700 nm and then to light of a wavelength of 200 to 380 nm which is shorter than the former.</p>
申请公布号 EP0720053(A2) 申请公布日期 1996.07.03
申请号 EP19950120733 申请日期 1995.12.29
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 IWAI, TAKESHI;KOMANO, HIROSHI
分类号 G03F7/028;G03F7/105;(IPC1-7):G03F7/028 主分类号 G03F7/028
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