发明名称 COLORED PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>PURPOSE: To obtain aq. solution of a colored photosensitive resin composition capable of forming a photosetting film uniform and free from mottle without being affected by an absorption hole of a substrate holder or the like at the time of applying on a substrate to form a pattern of the photosetting film by specifying contact angle of the colored photosensitive resin composition to the substrate so as to be equal to or below a specific angle. CONSTITUTION: The aq. solution of the colored photosensitive resin composition is used for forming the pattern of the photosetting film applied on the substrate, contains a dispersed pigment and has <=50 deg. contact angle to the substrate. As the photosensitive resin of the composition, a photosensitive resin soluble in an organic solvent or water soluble photosensitive resin compound of a photosensitive polymer alone or the combination with a photopolymerizing monomer is used and particularly, the water soluble photosensitive resin is preferable. The adjustment of the contact angle to make <=50 deg. is executed by adjusting the quantity, kind and balance between hydrophilic group and hydrophobic group about a surfactant used as a dispersant of the pigment.</p>
申请公布号 JPH08171200(A) 申请公布日期 1996.07.02
申请号 JP19940313121 申请日期 1994.12.16
申请人 SEKISUI CHEM CO LTD 发明人 TATENO MASAHIKO
分类号 G03F7/004;G02B5/20;G03F7/027;G03F7/033;G03F7/038;(IPC1-7):G03F7/004 主分类号 G03F7/004
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