发明名称 COLORED PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>PURPOSE: To obtain aq. solution of a colored photosensitive resin composition capable of forming a pattern of photosetting film, which is uniform and free from mottle, without being affected by a previously formed pattern at the time of forming successively photosetting films applied on a substrate by specifying a contact angle of the photosetting film formed from a colored photosensitive composition to water so as to be equal to below a specific angle. CONSTITUTION: The aq. solution of the colored photosensitive resin composition is used for forming the pattern of the photosetting film applied on the substrate, contains a dispersed pigment and the contact angle of the photosetting film formed from the composition to water is <=80 deg.. When the contact angle is over 80 deg., the composition to be applied next time is repelled in the vicinity of the previously formed pattern and mottle is easily generated in the vicinity part of the pattern with the thickness of the coated film changed. The adjustment of the contact angle to make <=80 deg. is executed by adjusting the quantity, kind and balance between hydrophilic group and hydrophobic group about a surfactant used as a dispersant of the pigment.</p>
申请公布号 JPH08171199(A) 申请公布日期 1996.07.02
申请号 JP19940313120 申请日期 1994.12.16
申请人 SEKISUI CHEM CO LTD 发明人 TATENO MASAHIKO
分类号 G03F7/004;G02B5/20;G03F7/008;G03F7/016;G03F7/033;G03F7/038;(IPC1-7):G03F7/004 主分类号 G03F7/004
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