发明名称 ALLOY FOR GAS PURIFICATION AND GAS PURIFICATION PROCESS
摘要 PURPOSE: To produce an alloy capable of efficiently removing impurity components, particularly hydrocarbon and nitrogen, from a gas used for semiconductor manufacture, special lamps, etc., by specifying the composition of a Zr-base alloy. CONSTITUTION: This alloy is an alloy for gas purification, having a composition represented by composition formula Ax Vy B2.0-y when A represents a combination of any of ZrHf, ZrMm, and ZrHfMm and B represents at least one element among Al, Fe, and W [where Mm means misch metal, V means vanadium, and (x) and (y) in the composition formula satisfy the conditions of 0.80<=x<=2.50 and 1.00<=y<=1.90, respectively]. It is preferable to add Ta and Mo further to the composition. At this time, the composition formula, when C(Ta, Mo) means at least either of Ta and Mo, is represented by Ax Vy (BC)2.0-y . At the time of gas purification, a powder of each alloy of <=100μm grain size is pelletized and the resulting pellets are brought into contact with the gas to be purified and allowed to absorb the impurities in the gas.
申请公布号 JPH08165534(A) 申请公布日期 1996.06.25
申请号 JP19940309075 申请日期 1994.12.13
申请人 SUMITOMO METAL IND LTD;SUMIKIN MORI KOOPU KK 发明人 KAMINAKA HIDEYA;NEGI NORIYUKI;TERANISHI HIROSHI;HARA MASAYUKI
分类号 B01J20/02;B01J20/08;C22C16/00;C22C27/02;(IPC1-7):C22C16/00 主分类号 B01J20/02
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