| 摘要 |
PURPOSE: To provide a double-sided aligner which does not require high machining accuracy for a mask supporting mechanism and where masks on both sides are brought into parallel contact with a material to be exposed in a state where assembling and adjusting operation is facilitated. CONSTITUTION: This double-sided aligner is provided with a front-side Z-axis frame 7a and a back-side Z-axis frame 7b to which a 1st mask supporting mechanism (mask base 6a, etc.) and a 2nd mask supporting mechanism(mask base 6b, etc.) arranged to be opposed to both sides of the material to be exposed 2 are attached. The Z-axis frames 7a and 7b are moved in an opposed direction so as to bring a front-side glass mask 3a and a back-side glass mask 3b respectively supported by the 1st and the 2nd mask supporting mechanisms into contact with the material 2, and patterns formed on the glass masks 3a and 3b are simultaneously exposed to the opposed surfaces of the material 2. By thinning at least either the Z-axis frame 7a or 7b in thickness, the rigidity thereof in the opposed direction is made low so that the frame 7a or 7b is easily elastically deformed. |
