| 摘要 |
PURPOSE: To provide an X-ray apparatus in which an X-ray optical element can be brought sufficiently close to an X-ray source to increase the X-ray radiating quantity to the element, and the quantity of scattered particles (emission substance) emitted from the source to adhere to and deposit on the element is reduced, thereby, preventing the X-ray optical element from degrading in performance. CONSTITUTION: The X-ray apparatus comprises at least X-ray sources 105, 106, and an X-ray optical element 109 on which X-rays 108 emitted from the sources 105, 106 are incident. Further, the apparatus comprises a heater 110 for heating the element 109 to evaporate emission substances 107 from the sources 105, 106 to be adhered to or deposited or adhesively deposited on the element 109. |
