发明名称 |
METHOD FOR FABRICATING ASYMMETRICAL LDD MOS DEVICES |
摘要 |
A method of fabricating a true-LDD MOS transistor is described. The fabrication method includes the step of forming an LDD photoresist mask layer on a semiconductor substrate. The mask is aligned to the gate structure and extended to cover a drain region, a lightly doped ion implant is performed in the drain region which is self-aligned with the gate structure and the LDD photoresist mask is removed. Spacers are then formed on the source side and the drain side of the gate structure and a heavily doped ion implant is applied to dope the source region and the drain region which are self-aligned with the gate structure and spacers.
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申请公布号 |
WO9619010(A1) |
申请公布日期 |
1996.06.20 |
申请号 |
WO1995US15021 |
申请日期 |
1995.11.22 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
JOH, DAE, YEONG |
分类号 |
H01L21/336;H01L21/8234;H01L21/8238;H01L27/088;H01L29/78;(IPC1-7):H01L21/336;H01L21/823;H01L27/092 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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