发明名称
摘要 <p>PURPOSE:To prevent a wafer from being contaminated by a method wherein a specific resin is used for a housing container of an IC wafer. CONSTITUTION:A high nitrile resin whose content of an unsaturated nitrile monomer is 50weight% or higher is molded. The high nitrile resin is a copolymer which is composed mainly of the unsaturated nitrile monomer such as acrylonitrile, methacrylonitrile or the like; styrene, butadiene, isoprene or the like can be enumerated as a monomer which can be copolymerized with the unsaturated nitrile monomer; one or more kinds of them are copolymerized with the unsaturated nitrile monomer. Thereby, a chemical-resistant property can be enhanced; it is possible to prevent a swelling by a solvent from being caused and an IC wafer from being contaminated.</p>
申请公布号 JP2507803(B2) 申请公布日期 1996.06.19
申请号 JP19890085694 申请日期 1989.04.06
申请人 MITSUI TOATSU CHEMICALS 发明人 MAKIHARA MASAYUKI;TATSUNO TOSHIRO;FUJITA MITSUNOBU
分类号 C08J5/00;C08F20/00;C08F20/42;H01L21/673;H01L21/68;(IPC1-7):H01L21/68 主分类号 C08J5/00
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