DEVICE FOR PLASMA-SUPPORTED ELECTRON BEAM HIGH-RATE VAPOUR DEPOSITION,申请号EP19930918893-传众专利搜索

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发明名称	DEVICE FOR PLASMA-SUPPORTED ELECTRON BEAM HIGH-RATE VAPOUR DEPOSITION
摘要
申请公布号	EP0666933(B1)	申请公布日期	1996.06.12
申请号	EP19930918893	申请日期	1993.08.18
申请人	FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.	发明人	NEUMANN, MANFRED;SCHILLER, SIEGFRIED;MORGNER, HENRY
分类号	C23C14/30;C23C14/10;C23C14/32;C23C14/54;H01J37/305;(IPC1-7):C23C14/32	主分类号	C23C14/30
代理机构		代理人
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