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经营范围
发明名称
Radiation sensitive mixture
摘要
申请公布号
EP0447868(B1)
申请公布日期
1996.06.05
申请号
EP19910103276
申请日期
1991.03.05
申请人
BASF AKTIENGESELLSCHAFT
发明人
NGUYEN, KIM, SON, DR.
分类号
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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