发明名称 PRODUCTION OF SUBSTRATE FOR PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
摘要 PURPOSE: To produce a photosensitive planographic printing plate having excellent plate making performance, such as sensitivity and exposed visible image characteristic, by subjecting the printing plate to a pretreatment, electrolytic surface roughening treatment, desmutting treatment and anodic oxidation under specific conditions. CONSTITUTION: An aluminum sheet is subjected to the pretreatment to execute alkaline etching at an aluminum melting rate in a range of 1 to 5g/m<2> and is then subjected to the electrolytic surface roughening treatment in an electrolytic bath mainly composed of a nitric acid. This sheet is subjected to the desmutting treatment to execute the alkaline etching at the aluminum melting rate in a range of 0.5 to 2g/m<2> . The sheet is then subjected to the anodic oxidation in the electrolytic bath mainly composed of a sulfuric acid. The treatment conditions for the alkaline etching of the pretreatment, etc., are specified to a bath concn. of 60±10g/l, a bath temp. of 85±10 deg.C and treatment time of >=3 seconds. The desmutting conditions are respectively specified to 9±2g/l and 70±5 deg.C, and >=3 seconds. The surface of the substrate (treated sheet) may be provided with a photosensitive layer contg. a quinone diadize compd. by treating the sheet in a treating bath contg. ammonium after the anodic oxidation treatment. As a result, the photosensitive planographic printing plate having excellent printability, such as staining resistance and plate wear, is provided.
申请公布号 JPH08144090(A) 申请公布日期 1996.06.04
申请号 JP19940280912 申请日期 1994.11.15
申请人 MITSUBISHI CHEM CORP;KONICA CORP 发明人 MIYAZAKI TAKESHI;TOMIYASU HIROSHI;KAJIWARA SHIGERU
分类号 G03F7/00;B41N3/03;C25D11/16;C25F3/04;(IPC1-7):C25D11/16 主分类号 G03F7/00
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