发明名称 WAFER CLEANING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To prevent the surface of a semiconductor chip from being scratched and the semiconductor chip from being contaminated due to the water drop of a cleaning water by forming a cover for opening and closing the exit/entrance of the top part of a cylindrical body in conical body shape, such that an upper part is in a projecting shape and a top part is at an obtuse angle. SOLUTION: A suction pipe 24 passes through the center of a frame 22 and that of a rotary table 23, sucks the lower surface of a wafer 21 that is placed on the frame 22, and is stabilized. A cylindrical body 26 is installed around the rotary table 23 and a water nozzle 25 is mounted through a sidewall so that a cleaning water for cleaning the wafer 21 can spray water to the center of the wafer 21 placed on the frame 22. Then, a cover 27 whose upper part is in projection shape opens and closes the entrance/exit of the top part of the body 26, and a base 28 retains a body 26. The cover 27 for opening and closing the exit/entrance of the top part of the body 26 may be formed in a conical body shape, where the vertical angle is at an obtuse angle.</p>
申请公布号 JPH08139065(A) 申请公布日期 1996.05.31
申请号 JP19950217288 申请日期 1995.08.25
申请人 L G SEMIKON CO LTD 发明人 JIYUNGUUGUN PAAKU
分类号 B08B3/02;H01L21/301;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利