发明名称 WAFER TURN-OVER BASE HAVING CLEANING FUNCTION ARRANGED ON A WADER POLISHING DEVICE
摘要 <p>PURPOSE: To enable the wafer cleaning work without replacing wafer receivers in every different diameters at all by arranging plural numbers of cocentric wafer receivers wherein stoppers in different diameter fulfiling cleaning function are disposed in upright. CONSTITUTION: The wafer inversion base is composed of a water supply part 2, a circular cylindrical body 3 wherein a pair of stoppers 3 using a part of peripheral wall edge making a gap to be a running water path disposed in upright in the central part, the other circular cylindrical bodies 4, 5 having successively larger diameters and successively increased level outside wherein a pair of stoppers 4A, 5A using a part of peripheral wall edge making a gap to be running water path cocentrically and integrally arranged. In such a constitution, the wafers 10 in respective diameters are stopped on a specific positions corresponding to the diameters thereof to turn over with the centers thereof aligned with the centers of the turn-over base. At this time, every stopped wafers 10 are reversely mounted by the wafer turn-over mechanism at the ends of a conveyor thereby enabling the wafers 10 to be cleaned up without replacing the wafer receivers.</p>
申请公布号 JPH08139059(A) 申请公布日期 1996.05.31
申请号 JP19940303029 申请日期 1994.11.11
申请人 SHIBAYAMA KIKAI KK 发明人 KOBAYASHI KAZUO
分类号 B23Q3/02;H01L21/301;H01L21/304;(IPC1-7):H01L21/304 主分类号 B23Q3/02
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