发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, FABRICATION THEREOF AND INTERNAL VOLTAGE GENERATION CIRCUIT
摘要 PURPOSE: To obtain a high speed low power consumption semiconductor memory by reducing the sub-threshold current at the time of stand-by of a gate circuit and lowering the voltage difference between a main and sub power supply voltage transmission lines. CONSTITUTION: A main power supply voltage transmission line 100 for transmitting a power supply voltage VCH and a sub-power supply voltage transmission line 110 are provided, as one power supply, for a gate circuit G. A high resistance element R is connected between main and sub-power supply voltage transmission lines 100, 110 and a capacitor C comprising an insulated gate FET is connected with the sub-power supply voltage transmission lines 110. The fate circuit G is operated with a voltage VC on the sub-power supply voltage transmission lines 110. Consequently, the voltage on the sub-power supply voltage transmission lines 110 is sustained at a level being balanced with the sub- threshold current of the gate circuit G and the voltage VC is sustained stably by means of the capacitor C.
申请公布号 JPH08138381(A) 申请公布日期 1996.05.31
申请号 JP19940272592 申请日期 1994.11.07
申请人 MITSUBISHI ELECTRIC CORP 发明人 OISHI TSUKASA
分类号 G11C11/413;G11C5/14;G11C7/06;G11C7/14;G11C8/14;G11C11/401;G11C11/407;G11C11/4074;G11C11/408;G11C11/409;G11C11/4094;H01L21/822;H01L21/8238;H01L21/8242;H01L27/04;H01L27/092;H01L27/108;H03K19/00 主分类号 G11C11/413
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