发明名称 Monolithic integrated structure to protect a power transistor against overvoltage
摘要 A structure of an electronic device having a predetermined unidirectional conduction threshold is formed on a chip of an N-type semiconductor material and includes a plurality of isolated N-type regions. Each isolated N-type region is bounded laterally by an isolating region and at the bottom by buried P-type and N-type regions which form in combination a junction with a predetermined reverse conduction threshold and means of connecting the junctions of the various isolated regions serially together. The buried N-type region of the first junction in the series is connected to a common electrode, which also is one terminal of the device, over an internal path of the N-type material of the chip, and the buried P-type region of the last junction in the series contains an additional buried N-type region which is connected electrically to a second terminal of the device.
申请公布号 US5521414(A) 申请公布日期 1996.05.28
申请号 US19940234334 申请日期 1994.04.28
申请人 SGS-THOMSON MICROELECTRONICS S.R.L. 发明人 PALARA, SERGIO
分类号 H01L29/73;H01L21/331;H01L21/822;H01L27/02;H01L27/04;H01L27/06;H01L29/732;H01L29/78;(IPC1-7):H01L23/62;H01L27/082;H01L29/00;H01L29/76 主分类号 H01L29/73
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