发明名称 |
Electrical contact compositions and novel manufacturing method |
摘要 |
A new class of low chop contact materials based on Ag-chromium carbide and Ag-Cr compositions have an essentially 100% dense, porosity free microstructure. These materials combine the advantageous properties of Ag-WC and Cu-Cr contacts without their disadvantages. A method of making this new class of low chop contact materials includes the steps of cold pressing a mixture of Ag and chromium or chromium carbide to form an unsintered blank and the elevated temperature infiltration of silver into the unsintered blank to obtain an essentially 100% dense, porosity free microstructure.
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申请公布号 |
US5516995(A) |
申请公布日期 |
1996.05.14 |
申请号 |
US19940220129 |
申请日期 |
1994.03.30 |
申请人 |
EATON CORPORATION |
发明人 |
WHITLOW, GRAHAM A.;LOVIC, WILLIAM R.;SLADE, PAUL G. |
分类号 |
C22C5/06;H01H1/02;H01H1/023;H01H11/04;(IPC1-7):H01H1/02 |
主分类号 |
C22C5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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