发明名称 Electrical contact compositions and novel manufacturing method
摘要 A new class of low chop contact materials based on Ag-chromium carbide and Ag-Cr compositions have an essentially 100% dense, porosity free microstructure. These materials combine the advantageous properties of Ag-WC and Cu-Cr contacts without their disadvantages. A method of making this new class of low chop contact materials includes the steps of cold pressing a mixture of Ag and chromium or chromium carbide to form an unsintered blank and the elevated temperature infiltration of silver into the unsintered blank to obtain an essentially 100% dense, porosity free microstructure.
申请公布号 US5516995(A) 申请公布日期 1996.05.14
申请号 US19940220129 申请日期 1994.03.30
申请人 EATON CORPORATION 发明人 WHITLOW, GRAHAM A.;LOVIC, WILLIAM R.;SLADE, PAUL G.
分类号 C22C5/06;H01H1/02;H01H1/023;H01H11/04;(IPC1-7):H01H1/02 主分类号 C22C5/06
代理机构 代理人
主权项
地址