| 摘要 |
PURPOSE: To provide a surface area having less dislocation by applying an acidic solution to a polished surface and polishing the surface with a polishing surface. CONSTITUTION: A ferroelectric surface to be polished is provided, and those acids selected from a group of organic acid, mineral acid, reducing acid, oxidizing acid, and a combination thereof of an amount larger than zero to approx. 80 vol.%, strong oxidizer of an amount larger than zero to approx. 80 vol.%, and the remaining acid solution containing water are applied to the surface. The surface is polished with a polishing surface. In this case, perovskite material is used as a ferroelectric material. A polishing agent substantially comprises a perchloric acid of approx. 75 pts.wt., approx. 70% hydrogen peroxide of 75 pts.wt. and the remaining water of approx. 450 pts.wt.
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