发明名称 Micro-pattern measuring apparatus
摘要 A scanning electron microscope scans a sample with an electron beam in a transverse direction, to measure the size of the sample. The microscope has an electron gun for emitting an electron beam, a scan coil and an electron lens for periodically deflecting the electron beam, a detector for detecting a secondary electron signal, a unit for measuring the size of the sample according to the secondary electron signal and displaying the sample, and a probe for catching charged electrons on the sample. This microscope correctly measures the size of a sample that is made of easily-charged material such as photoresist or insulation material.
申请公布号 US5512746(A) 申请公布日期 1996.04.30
申请号 US19940309660 申请日期 1994.09.21
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SAITO, TSUYOSHI
分类号 G01B15/00;G01Q60/40;H01J37/28;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01B15/00
代理机构 代理人
主权项
地址