发明名称 Verfahren zum Formen von elektrischen Verbindungen in laminierten Kontaktlöchern
摘要 A method for forming electrical interconnections in vias is provided by laser drilling vias in a composite that contains at least two circuitized organic polymeric substrates superimposed upon each other. The laser drilling causes metallic circuit lines (5,6) contained within each substrate to melt and form a fused mass (9) protruding a short distance out of the side of the drilled vias. Next, the drilled vias are plated with a conductive metal to thereby provide the interconnections. <IMAGE>
申请公布号 DE69301812(D1) 申请公布日期 1996.04.18
申请号 DE1993601812 申请日期 1993.11.22
申请人 INTERNATIONAL BUSINESS MACHINES CORP., ARMONK, N.Y., US 发明人 RUANE, ROBERT EMMETT, ENDICOTT, NEW YORK 13760, US;WHITE, JR., RUSSELL THOMAS, CONKLIN, NEW YORK 13748, US
分类号 H01R3/00;H05K3/00;H05K3/42;H05K3/46;(IPC1-7):H05K3/42;H05K3/40 主分类号 H01R3/00
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