发明名称 EPITAXIAL CRYSTAL GROWTH DEVICE
摘要 <p>PURPOSE: To provide an epitaxial crystal growth device by which crystal growth can be performed in a plurality of growth modes with one growth device. CONSTITUTION: By opening the gate valve 17 arranged between a preliminary vacuum chamber 14 and a growth chamber 3, the preliminary vacuum chamber 14 comes to communicate with the growth chamber 3, and the gas inside the growth chamber 3 is sucked out, and the pressure within the growth chamber 3 drops suddenly, and it shifts speedily from low vacuum condition to high vacuum condition.</p>
申请公布号 JPH0897147(A) 申请公布日期 1996.04.12
申请号 JP19940235020 申请日期 1994.09.29
申请人 MITSUBISHI ELECTRIC CORP 发明人 KADOIWA KAORU;SONODA TAKUJI
分类号 C30B25/06;C30B23/02;C30B25/14;H01L21/20;H01L21/203;H01L21/677;(IPC1-7):H01L21/203;H01L21/68 主分类号 C30B25/06
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