| 摘要 |
PURPOSE: To provide a new resist compsn. excellent in adhesiveness to a substrate as well as profile, sensitivity, heat resistance and the depth of a focus and not causing bursting due to exposure. CONSTITUTION: This resist compsn. contains quinonediazido ester and a resin obtd. by condensing at least one kind of phenol having one or two hydroxyl groups with aldehyde. The resin is an alkali-soluble resin contg. a resin having a wt. average mol.wt. of 1,500-5,000 (expressed in terms of polystyrene) in a GPC pattern measured with a detector emtting UV of 254nm. In the GPC pattern, the area of the mol.wt. range of <900 (expressed in terms of polystyrene) accounts for <=25% of the total pattern area except the pattern area of the unreacted phenol and the area of the mol.wt. range of <=6,000 accounts for >=80% of the total pattern area except the pattern area of the unreacted phenol. |
