METHOD FOR MANUFACTURING HIGH TEMPERATURE SUPERCONDUCTIVE OXIDE THIN FILM

摘要

A method for manufacturing a high temperature superconductive oxide thin film in which the oxide superconductive thin film is formed under a high partial pressure of oxygen, and there is no necessity of the aftertreatment of keeping the superconductive thin film at a low temperature in an atmosphere of oxygen after forming it. The "Tc end" is high, and moreover there is no noise when this film is used in a superconductive device. The high temperature superconductive oxide thin film is formed on an oxide substrate by irradiating an oxide target with a laser beam in the atmosphere of oxygen. The laser beam is projected from behind the substrate, and is transmitted through it, and further is projected on the oxide target.