| 发明名称 |
Method for low temperature chemical vapor deposition of aluminides containing easily oxidized metals |
| 摘要 |
A method is disclosed to deposit aluminum and a metal oxide on substrates for improved corrosion, oxidation, and erosion protection. Low temperature chemical vapor deposition is used. A homogeneous biphase coating may be deposited, as well as layers of aluminum and metal oxides.
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| 申请公布号 |
US5503874(A) |
申请公布日期 |
1996.04.02 |
| 申请号 |
US19940315805 |
申请日期 |
1994.09.30 |
| 申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
ACKERMAN, JOHN F.;STOWELL, WILLIAM R.;WOOD, JOHN H.;BELTRAN, ADRIAN M. |
| 分类号 |
C23C16/02;C23C16/20;C23C16/30;(IPC1-7):B05D7/22;C23C16/00 |
主分类号 |
C23C16/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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