发明名称 |
Method and device for treatment of products in gas-discharge plasma |
摘要 |
PCT No. PCT/RU92/00088 Sec. 371 Date Dec. 13, 1993 Sec. 102(e) Date Dec. 13, 1993 PCT Filed Apr. 23, 1992 PCT Pub. No. WO92/19785 PCT Pub. Date Nov. 12, 1992.A method for treatment of products in gas-discharge plasma consists in that a two-step vacuum-arc discharge is initiated between an anode (3) and an integrally cold cathode (2), featuring a metal-gaseous step of plasma and a gaseous step of plasma. The gaseous step of plasma is established by ionizing the working gas with electrons separated from the metal-gaseous step of plasma. Then a product (5) under treatment is preheated to working temperature and held in a preset temperature range. To this end, provision is made in the device for a means (13) for electron separation from the metal-gaseous step of plasma, which means is situated in the zone of the integrally cold cathode (2) and is impermeable to the metal ions generated by the cathode (2). In a particular case the means (13) is made as a set of V-shaped plates (14).
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申请公布号 |
US5503725(A) |
申请公布日期 |
1996.04.02 |
申请号 |
US19930146043 |
申请日期 |
1993.12.13 |
申请人 |
NOVATECH |
发明人 |
SABLEV, LEONID P.;ANDREEV, ANATOLY A.;CRIGORIEV, SERGEI N.;METEL, ALEXANDR S. |
分类号 |
C23C8/36;C23C14/02;C23C14/32;H01J27/08;H01J37/32;(IPC1-7):C23C14/34 |
主分类号 |
C23C8/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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