发明名称 |
PHOTOSENSITIVE MATERIAL PROCESSOR |
摘要 |
PURPOSE: To settle such problems as the reproducibility of small dots, the con tamination of a printing plate or the prevention of pollution with respect to a photosensitive material processor reutilizing washing water. CONSTITUTION: A processing soln. stored in a developing tank 10 is circulated to develop an exposed photosensitive material PS, and the developed material is washed with water in a washing part C. In this photosensitive material processor, the washing water used in the washing part C is treated by a means for changing the org. component amt. and utilized as the dilution water for a replenishment processing soln. used in the developing tank. The washing water used in the washing part C is treated by the means for changing the org. component amt. and reutilized in the washing part C. Unused water is used in the washing part C, and the washing water used in the washing part C is treated by the means for changing the org. component amt. and then discharged outside the device. |
申请公布号 |
JPH0882937(A) |
申请公布日期 |
1996.03.26 |
申请号 |
JP19940243251 |
申请日期 |
1994.09.12 |
申请人 |
KONICA CORP;MITSUBISHI CHEM CORP |
发明人 |
ADACHI YUTAKA;NAKAI HIDEYUKI;SUZUKI TOSHITSUGU;KASAKURA AKIO;KANEDA KENJI |
分类号 |
G03F7/00;C02F9/00;G03F7/30 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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