发明名称 EQUIPMENT AND METHOD FOR AUTOMATIC PHOTOMASK INSPECTION
摘要 <p>PROBLEM TO BE SOLVED: To provide a device and a method for inspecting a substrate in order to automatically perform defect search and type classification at low cost with a little error, especially, to provide a substrate inspecting device and an automatic inspecting method for performing automatic inspection for searching and discovering defective particles and defective graphics different from the intension of a designer on the substrate of mask rectile, etc., and the automatic classification of types of these defects. SOLUTION: This device is composed of an illumination system for generating a light beam, passing that light beam through a fixed optical path and making it almost practically perpendicularly incident to the upper surface of an inspection substrate, transmitted light detector 34 for collecting and detecting the transmitted beams by adjusting them so as to be coaxial to that optical path, reflected light detector 36 for similarly collecting and detecting reflected light, comparator for providing a compare value by mutually comparing respective electric signals, and processor for separately providing the expected value of that compare value and discriminating the coincidence between the compare value and that expected value.</p>
申请公布号 JPH0876359(A) 申请公布日期 1996.03.22
申请号 JP19950177462 申请日期 1995.07.13
申请人 KLA INSTR CORP 发明人 DEIBITSUDO GAASU EMARII;ZAIN KAFUNA SAIDEIN;MAAKU JIEI UIRU;TAO II FUU;MAARETSUKU JIUNOO;DEEMON EFU KUBANMU;MAIKERU II FUEIN
分类号 G01B11/30;G01N21/88;G01N21/93;G01N21/94;G01N21/956;G03F1/00;H01L21/027;H01L21/66;(IPC1-7):G03F1/08 主分类号 G01B11/30
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