Plasma unterstützte chemische Dampfabscheidung von einem Oxidfilmstapel

摘要

A plasma enhanced chemical vapor deposition method is provided for depositing an oxide film onto a surface of a substrate (12). Deposition is achieved even onto a surface of a glass or other relatively non-receptive substrate. A sub-film (18) is deposited under plasma enhanced chemical vapor deposition conditions more strongly favoring deposition, followed by deposition of the desired oxide film (20) under second plasma enhanced chemical vapor deposition conditions less strongly favoring deposition. High quality oxide films can be achieved by deposition at second plasma enhanced chemical vapor deposition conditions only marginally favoring deposition over etching.