Plasma reactor for integrated circuit fabrication

摘要

The plasma reactor includes a wafer holder (14) which is connected to a reference potential. The plasma reactor further includes pump connecting pieces (12) and gas supplies (13). A plasma excitation apparatus (15) excites the plasma by coupling in electrical energy. The plasma excitation apparatus includes at least two apparatus parts (151,52) which can be independently driven. The plasma is differently excited at least two different sites above the wafer holder by the parts of the plasma excitation apparatus.