发明名称 MIS Bauelement mit zusätzlichem Gate.
摘要 In a MOSFET of an LDD structure, a side wall (51) is made conductive and connected to a gate (3) through a resistance (13) thereby to cause hot carriers taken into the side wall (51) to be discharged to a gate (3) through the resistance (13), whereby a channel resistance is prevented from being increased by an effect of carriers accumulated in the side wall (51). As a result, a reliable MOSFET with a short channel can be provided which is not degraded even if it is used for a long time.
申请公布号 DE68923629(T2) 申请公布日期 1996.03.21
申请号 DE1989623629T 申请日期 1989.02.13
申请人 HITACHI, LTD., TOKIO/TOKYO, JP 发明人 MINAMI, MASATAKA, HITACHI-SHI IBARAKI-KEN, JP;WAKUI, YOUKOU, NAKA-GUN IBARAKI-KEN, JP;NAGANO, TAKAHIRO, HITACHI-SHI IBARAKI-KEN, JP
分类号 H01L21/28;H01L21/336;H01L29/423;H01L29/43;H01L29/49;H01L29/78 主分类号 H01L21/28
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