发明名称 A method of evaluating silicon wafers
摘要 <p>The height xi (i = 1, 2, ..., N) of a plurality of measuring points on a silicon wafer from a reference plane is measured by means of an AFM (atomic force microscope), the autocorrelation function Rj represented by the equation below is determined: <MATH> Where x denotes: <MATH> is determined, an arbitrary number of autocorrelation function Rj with large value from said autocorrelation function Rj are selected, and the microroughness on said silicon wafer is analyzed based on the distances between the point Rj=0 and said selected points Rj's with large value except for Rj=0. <IMAGE></p>
申请公布号 EP0702204(A2) 申请公布日期 1996.03.20
申请号 EP19950114565 申请日期 1995.09.15
申请人 SHIN-ETSU HANDOTAI COMPANY LIMITED 发明人 AIHARA, KEN;KITAGAWARA, YUTAKA;TAKENAKA, TAKAO
分类号 H01L21/66;G01B7/34;G01B11/24;G01Q30/08;G01Q30/20;G01Q60/24;(IPC1-7):G01B7/34 主分类号 H01L21/66
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