| 摘要 |
PURPOSE: To provide a reflection mirror capable of suppressing thermal distortion due to X-ray irradiation low enough and its production method. CONSTITUTION: A reflection mirror is provided with a base 1 made of Invar having linear thermal expansion coefficient of 1×10<-7> /K or less and a thin film 2 of an amorphous material with a main component of silicondioxide (SiO2) or silicon carbide (SiC) which is formed on the surface of the base 1 and polished optically smoothly. In the case used as a reflection mirror for an X-ray optical system, multiple layer film 4 reflecting X-ray of specific wave length is formed on the surface of the thin film 2. |
