发明名称 MANUFACTURE OF SHADOW MASK
摘要 PURPOSE: To prevent holes, to be formed in an etching process, from being too small and generation of black stains, etc., by specifying the max. grain size of water drops remaining on a metal material. CONSTITUTION: Each nonwoven fabric roll 1 is formed from polyethylene, polystylene, etc., having a good water absorptivity and no risk of producing dust and mounted on hollow roll shafts 2 having a number of holes, and such are installed on each surface of a metal material 3. The rolls 1 are contacted with the metal material 3 by a certain pressure and rotated in accordance with the transport speed of the material 3. The material 3 having undergone development. film hardening process with contact of nonhydrate chromium acid solution, and rinsing with water is passed between the rolls 1 so that water drops on the material 3 are absorbed by the rolls 1. At this time, vacuum attraction is made at the ends of the roll shafts 2 so that the water contained in thr rolls 1 is sucked away through the through holes in the shafts 2, and grain sizes of the water drops remaining on the material 3 are made under 50μm, followed by a burning process.
申请公布号 JPH0869751(A) 申请公布日期 1996.03.12
申请号 JP19940205060 申请日期 1994.08.30
申请人 TOPPAN PRINTING CO LTD 发明人 UEDA KAZUHIRO
分类号 H01J9/14;(IPC1-7):H01J9/14 主分类号 H01J9/14
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