发明名称 Process for patterning poly(arylenevinylene) polymer films by irradiation with light
摘要 A process for forming a pattern which comprises irradiating with light a film of a poly(arylenevinylene) polymer represented by the following formula (I) -(Ar-CR<1> = CR<2>)n- wherein Ar is s substituted or unsubstituted divalent aromatic hydrocarbon group or a substituted or unsubstituted divalent heterocyclic ring group, and the aromatic hydrocarbon group and the heterocyclic ring group may be a fused ring, R<1>, R<2> independently of each other, are H, CN, alkyl, alkoxy are substituted or unsubstituted aromatic hydrocarbon groups or substituted or unsubstituted aromatic heterocycles, which may both be fused rings, and n is an integer of 2 or more. It is preferred that either R<1> or R<2> is H and more preferred that both R<1> and R<2> are H. , a patterned poly(arylenevinylene) polymer film produced by the above-described process, as well as an organic electroluminescent device containing the patterned poly(arylenevinylene) polymer film are disclosed. According to the process described above, the fluorescence intensity of the portion irradiated with light can be decreased in stages whereby a poly(arylenevinylene) polymer film having a pattern of the desired fluorescence intensity can be obtained.
申请公布号 EP0700235(A1) 申请公布日期 1996.03.06
申请号 EP19950112829 申请日期 1995.08.16
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 KANG, WEN-BING;YU, NU, DR.;TOKIDA, AKIHIKO
分类号 G03C1/73;C08G61/00;C08G61/02;C08G61/12;C09K11/06;H01L33/26;H01L33/42;H01L33/50;H01L51/50;H05B33/10;H05B33/12;H05B33/14 主分类号 G03C1/73
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