| 摘要 |
PURPOSE:To excellently transfer the pattern of a mask to a substrate without lowering a throughput. CONSTITUTION:An exposure device for performing exposure while moving a mask and a substrate to a projection optical system has a first illumination optical system ILa for illuminating the surface of a mask (M), a second illumination optical system ILb for illuminating the surface of a mask in the different region from the first illumination optical system a first projection optical system PLa for forming the erecting image of the mask illuminated by the first illumination optical system on a substrate (P) and a second projection optical system (PLb) for forming the erecting image of the mask illuminated by the second illumination optical system on the substrate. Illuminated region moving means 101a, 102a, 101e, 102e for moving the illuminated region are provided in the first and the second illumination optical systems. |
