| 摘要 |
<p>X-ray dispersive and reflective structure (10) utilizing special materials which exhibit improved performance in the specific ranges of interest. The structures (10) are formed of alternating thin layers (A and B) of uranium, uranium compound or uranium alloy and another spacer material consisting of elements or compounds with low absorptance chosen to match the wavelength of interest. These low index of refraction elements of compounds are those best suited for water window microscopy and nitrogen analysis, or are similar elements or compounds best suited for carbon analysis, boron analysis, and x-ray lithography using x-rays (11 and 12). The structures are constructed using standard thin layer deposition techniques such as evaporation, sputtering and CVD, or by novel methods which allow thinner and smoother layers to be deposited.</p> |
