发明名称 JIG FOR PROCESSING SEMICONDUCTOR
摘要 <p>PURPOSE:To prevent wafers from being contaminated by drops of liquid, which may be formed when the wafers are taken out of a cleaning bath at the end of a wafer cleaning process in semiconductor device processing. CONSTITUTION:A jig for processing semiconductor wafers 6 consists of a wafer holding section 4 that includes at least opposed walls; and a handle 2 having hooks 5 that are fit onto the walls of the holding section 4. The handle has no projection facing in the direction of wafers in its portion to be positioned above the wafers. Since there is no projection on the handle on the wafer holding section side, liquid will not run along such a projection to drop on the semiconductor wafers even if the handle is soaked with the liquid. This makes it possible to prevent semiconductor wafers from being contaminated.</p>
申请公布号 JPH0837228(A) 申请公布日期 1996.02.06
申请号 JP19940173859 申请日期 1994.07.26
申请人 HITACHI LTD;HITACHI TOBU SEMICONDUCTOR LTD 发明人 KIKUCHI TAKAO
分类号 B08B11/04;B08B3/00;B65G49/07;H01L21/304;H01L21/673;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B08B11/04
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