| 摘要 |
<p>A process of providing at least a partial barrier to moisture vapour transfer through the surface of a material without substantially spoiling the material, said process comprising: (A) subjecting the material to a controlled temperature and humidity environment, said environment being at a temperature and partial vapour pressure of water which do not spoil the material, and, in which the partial vapour pressure of water of said environment is below saturation; (B) irradiating the material in the environment with infrared radiation, said amount of infrared radiation being sufficient to at least partially seal the surface of the material to provide at least a partial barrier to moisture vapour transfer through the surface of the material without spoiling the material; and (C) maintaining (i) the temperature of the environment, and (ii) the partial vapour pressure of water of said environment below saturation, whereby the material is not spoilt during step (B).</p> |
