| 摘要 |
<p>An electrostatic chuck (20) having reduced erosion in erosive process environments is described. The electrostatic chuck comprises an insulator (22) with (i) an electrode (24) therein, (ii) a central portion (25) overlying the electrode, and adapted to support a substrate thereon, and (iii) a peripheral portion (26) extending beyond the electrode. In one version of the invention, the central portion of the insulator is raised relative to the lower peripheral portion of the insulator, thereby defining a step having a height H, which is maintained at less than about 10 microns, to reduce erosion of the insulator. In another version of the chuck, the peripheral portion of the insulator extends beyond the electrode and has a width W, which is maintained at at least about 2mm to reduce erosion of the insulator. <MATH></p> |
